The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Jul. 06, 2001
Jozef Petrus Henricus Benschop, Veldhoven, NL;
Oscar Fransiscus Jozephus Noordman, Eindhoven, NL;
Michael Jozefa Mathijs Renkens, Geleen, NL;
Erik Roelof Loopstra, Heeze, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Antonius Johannes Josephus van Dijsseldonk, Hapert, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes a radiation system for supplying a projection beam of radiation having a propagation direction, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the lithographic projection apparatus further includes a sensor for measuring a movement of the projection beam perpendicular to its propagation direction and a controller to control a received dose of the projection beam on a target portion of the substrate in response to an output from the sensor.