The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2003
Filed:
Oct. 12, 2000
Yuji Kamikawa, Koshi-machi, JP;
Naoki Shindo, Kurume, JP;
Shigenori Kitahara, Chikugo, JP;
Miyako Yamasaka, Nagasaka-cho, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A cleaning equipment generally comprises: a cleaning bath for storing therein a cleaning solution to allow a semiconductor wafer W to be dipped in the cleaning solution to clean the surface of the wafer W; a cleaning solution supply pipe for connecting the cleaning bath to a pure water supply source a chemical storing container for storing therein a chemical; a chemical supply pipe for connecting the cleaning solution supply pipe to the chemical storing container via an injection shut-off valve and a diaphragm pump for injecting a predetermined amount of chemical from the chemical storing container into pure water flowing through the cleaning solution supply pipe The temperature of the cleaning solution in the cleaning bath is detected by, e.g., a temperature sensor On the basis of a detection signal outputted from the temperature sensor the amount of the chemical injected by the diaphragm pump is controlled so that the concentration of the chemical is a predetermined concentration. Thus, a predetermined amount of chemical can be injected so as to clean the wafer W with a predetermined concentration of chemical.