The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Jan. 22, 2002
Applicant:
Inventors:
Tso-Hung Fan, Taipei Hsien, TW;
Yen-Hung Yeh, Taoyuan Hsien, TW;
Kwang-Yang Chan, Hsinchu, TW;
Mu-Yi Liu, Taichung, TW;
Tao-Cheng Lu, Kaoshiung, TW;
Assignee:
Macronix International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 2/900 ;
U.S. Cl.
CPC ...
G11C 2/900 ;
Abstract
A Mask ROM testing device is described. The Mask ROM testing device comprises a substrate, a plurality of buried bit-lines in the substrate and a plurality of word-lines on the substrate perpendicular to the buried bit-lines. Each buried bit-line has two end portions with a combined length of about 3˜30 &mgr;m and can have an N-type conductivity or a P-type conductivity.
Fan, Tso-Hung. (2003). Device and method for testing mask rom for bitline to bitline isolation leakage (U.S. Patent No. 6587387). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6587387
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