The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Jan. 04, 2002
Applicant:
Inventors:
Min Li, Fremont, CA (US);
Simon H. Liao, Fremont, CA (US);
Masashi Sano, Nagano, JP;
Kiyoshi Noguchi, Nagano, JP;
Kochan Ju, Fremont, CA (US);
Cheng T. Horng, San Jose, CA (US);
Assignee:
Headway Technologies, Inc., Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/127 ; H04R 3/100 ;
U.S. Cl.
CPC ...
G11B 5/127 ; H04R 3/100 ;
Abstract
A method for forming a bottom spin valve sensor having a synthetic antiferromagnetic pinned (SyAP) layer, antiferromagnetically coupled to a pinning layer, in which one of the layers of the SyAP is formed as a three layer lamination that contains a specularly reflecting oxide layer of FeTaO. The sensor formed according to this method has an extremely high GMR ratio and exhibits good pinning strength.