The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
May. 14, 2001
Richard L. Sandstrom, Encinitas, CA (US);
Richard M. Ness, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Eckehard D. Onkels, San Diego, CA (US);
Choonghoon Oh, Temecula, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
The present invention provides a narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. The laser gas comprises F at a partial pressure less than about 1% with a buffer gas comprised of helium or neon or a combination of helium and neon. Control of center wavelength of the output beam is provided by adjusting one or more of the following parameters in the first laser: the total laser gas pressure, the relative concentration of helium or neon, F partial pressure, laser gas temperature, discharge voltage and pulse energy.