The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2003

Filed:

May. 09, 2001
Applicant:
Inventors:

Fu-Chang Hsu, San Jose, CA (US);

Hsing-Ya Tsao, San Jose, CA (US);

Peter W. Lee, Saratoga, CA (US);

Mervyn Wong, El Cerrito, CA (US);

Assignee:

Aplus Flash Technology, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 1/604 ;
U.S. Cl.
CPC ...
G11C 1/604 ;
Abstract

In the present invention a three step write of a nonvolatile single transistor cell is disclosed. The three steps comprise erasing, reverse programming and programming which can be applied to a plurality of cell types to produce a symmetrical design and allowing shrinkage of the cell beyond that which is possible with other cells designed to use a two step write procedure. The methodology can be applied to either N-channel or P-channel devices and can be used on various type memory cells such as “ETOX”, “NOR” type, “AND” type, and “OR” type. Erasing and programming steps increase the Vt of the cell transistor, whereas reverse programming decreases the Vt of the cell transistor. Over-erase problems are eliminated using the three step write procedure.


Find Patent Forward Citations

Loading…