The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Mar. 13, 2001
Applicant:
Inventors:
Rajiv Ranade, Brewster, NY (US);
Munir D. Naeem, Poughkeepsie, NY (US);
Gangadhara S. Mathad, Poughkeepsie, NY (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ;
U.S. Cl.
CPC ...
H01L 2/18242 ;
Abstract
A method for etching trenches includes providing a patterned mask stack on a substrate. A trench is etched in the substrate by forming a tapered-shaped trench portion of the trench, which narrows with depth in the substrate by employing a first plasma chemistry mixture including O , HBr and NF . An extended portion of the trench is formed by etching a second profile deeper and wider than the tapered-shaped trench portion in the substrate by employing a second plasma chemistry mixture including O , HBr and SF or F .