The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2003
Filed:
Aug. 07, 2001
Applicant:
Inventors:
David Mark Dobuzinsky, New Windsor, NY (US);
Babar Ali Khan, Ossining, NY (US);
Joyce C. Liu, Hopewell Junction, NY (US);
Paul R. Wensley, Poughquag, NY (US);
Chienfan Yu, Highland Mills, NY (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/122 ; H01L 2/138 ;
U.S. Cl.
CPC ...
H01L 2/122 ; H01L 2/138 ;
Abstract
A method of fabricating an integrated circuit chip having a first region of a first layout rule and a second region of a second layout rule. The method includes using a first material to establish a first hard mask pattern in only the first region and using a second material to establish a second hard mask pattern on top of the first hard mask pattern. The second material is additionally used to establish a third hard mask pattern in the second region.