The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2003
Filed:
Jul. 02, 1999
Applicant:
Inventors:
Akira Sekiya, Tsukuba, JP;
Tetsuya Takagaki, Tokyo, JP;
Shinsuke Morikawa, Yokohama, JP;
Shunichi Yamashita, Tokyo, JP;
Tsuyoshi Takaichi, Tokyo, JP;
Yasuo Hibino, Kawagoe, JP;
Yasuhisa Furutaka, Settsu, JP;
Masami Iwasaki, Tokyo, JP;
Norifumi Ohtsuka, Tokyo, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 1/500 ;
U.S. Cl.
CPC ...
C03C 1/500 ;
Abstract
Disclosed is fluorocarbon-based dry etching gas which is free of global environmental problems and a dry etching method using a plasma gas obtained therefrom. The dry etching gas includes a fluorinated ether of carbon, fluorine, hydrogen and oxygen and having 2-6 carbon atoms.