This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 834,513 Years Active: 2003
Title: Norifumi Ohtsuka: Innovator in Dry Etching Technology
Introduction
Norifumi Ohtsuka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of dry etching technology, particularly with his innovative approach to environmentally friendly etching gases.
Latest Patents
Ohtsuka holds a patent for a fluorocarbon-based dry etching gas. This gas is designed to be free of global environmental problems and is utilized in a dry etching method that employs a plasma gas derived from it. The dry etching gas consists of a fluorinated ether of carbon, fluorine, hydrogen, and oxygen, containing 2 to 6 carbon atoms.
Career Highlights
Throughout his career, Ohtsuka has focused on developing technologies that address environmental concerns while maintaining efficiency in industrial applications. His work has positioned him as a key figure in the advancement of sustainable practices in the semiconductor industry.
Collaborations
Ohtsuka has collaborated with notable colleagues, including Akira Sekiya and Tetsuya Takagaki. Their combined expertise has contributed to the successful development of innovative technologies in their field.
Conclusion
Norifumi Ohtsuka's contributions to dry etching technology highlight his commitment to innovation and environmental sustainability. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile