The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2002
Filed:
Oct. 23, 2001
Chad R. Binkerd, Burlington, VT (US);
Jose L. Cruz, Essex Junction, VT (US);
Timothy C. Krywanczyk, Essex Junction, VT (US);
Brian D. Pfeifer, Milton, VT (US);
Rosemary A. Previti-Kelly, Burlington, VT (US);
Patricia Schink, Burlington, VT (US);
Amye L. Wells, Underhill, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention provides a method of preventing the build-up of polishing material within low areas of a substrate during polishing. Following the blanket deposition of a first layer, a selectively removable material is deposited over the first layer, wherein the selectively removable material fills the low areas. A surface of the substrate is polished removing the excess first layer and selectively removable material from the surface, leaving the first layer and selectively removable material within the low area. Following polishing, the selectively removable material is removed from the low areas prior to the deposition of a second layer.