The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Dec. 14, 2000
Applicant:
Inventors:
Frederik Bijkerk, Amsterdam, NL;
Henryk Fiedorowicz, Warszawa, PL;
Cornelis C. de Bruijn, Sprundel, NL;
Andrzej Bartnik, Warszawa, PL;
Konstantin N. Koshelev, Troitzk, RU;
Vadim Y. Banine, Helmond, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/10 ; H01J 3/708 ;
U.S. Cl.
CPC ...
G21K 5/10 ; H01J 3/708 ;
Abstract
A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.