The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2002

Filed:

Jan. 14, 2000
Applicant:
Inventors:

Hiroyuki Yano, Yokohama, JP;

Nobuo Hayasaka, Yokosuka, JP;

Katsuya Okumura, Yokohama, JP;

Akira Iio, Yokkaichi, JP;

Masayuki Hattori, Ama-gun, JP;

Kiyonobu Kubota, Yokkaichi, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ; C01B 6/00 ;
U.S. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ; C01B 6/00 ;
Abstract

Water-laden solid matter is provided which is obtained by adding 40 to 300 weight parts of water to 100 weight parts of inorganic oxide particles synthesized by fumed process or metal evaporation oxidation process, slurry for polishing is provided which is manufactured by using the water-laden solid matter, and a method for manufacturing a semiconductor device using the above slurry. Said water-laden solid matter is within a range of 0.3 to 3 g/cm in bulk density and within a range of 0.5 to 100 mm&phgr; in average particle size when manufactured granular. Said slurry for polishing is manufactured from the water-laden solid matter, and the average particle size thereof after being dispersed in water is within a range of 0.05 to 1.0 &mgr;m.


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