The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Aug. 27, 1999
David B. James, Newark, DE (US);
William D. Budinger, Key West, FL (US);
John V. H. Roberts, Newark, DE (US);
Michael R. Oliver, Portland, OR (US);
Nina G. Chechik, Hockessin, DE (US);
Richard M. Levering, Jr., Hockessin, DE (US);
Lee Melbourne Cook, Steelville, PA (US);
Rodel Holdings Inc., Wilmington, DE (US);
Abstract
A chemical-mechanical polishing system which is particularly well suited for use in the manufacture of semiconductor devices or the like. The invention is directed to a polishing pad composition comprising a high modulus phase component and a low modulus phase component. The multi-phase polishing pads are very efficient and effective in providing high performance polishing along an entire polishing surface interface.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile