The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Nov. 12, 1999
Applicant:
Inventors:
Hiroshi Fukuda, Kodaira, JP;
Seiichiro Shirai, Ohme, JP;
Tsuneo Terasawa, Ohme, JP;
Katsuya Hayano, Ohme, JP;
Norio Hasegawa, Hinode, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G01N 2/100 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G01N 2/100 ; G03C 5/00 ;
Fukuda, Hiroshi. (2001). Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens (U.S. Patent No. 6329112). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6329112
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile