The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Apr. 15, 1999
Dmitry Lubomirsky, Cupertino, CA (US);
Allen I. D'ambra, Millbrae, CA (US);
Edward L Floyd, Santa Clara, CA (US);
Qiwei Liang, Fremont, CA (US);
Daniel J Hoffman, Saragota, CA (US);
Victor H Fuentes, Sunnyvale, CA (US);
Simon Yavelberg, Cupertino, CA (US);
Jerry C Chen, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Temperature control of a process chamber,is achieved by directing a flow of gas at an external surface,of the chamber,In one aspect, gas directed at the chamber,passes through a gas flow amplifier,that increases the gas flow. Gas for the temperature control can be drawn in from the ambient air and, after passing over the process chamber,the gas can flow out through an outlet,Data is presented demonstrating superior temperature control performance over a conventional system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile