The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Mar. 23, 1999
Shigehiro Hara, Kanagawa-ken, JP;
Eiji Murakami, Kanagawa-ken, JP;
Hitoshi Higurashi, Kanagawa-ken, JP;
Toshio Yamaguchi, Kanagawa-ken, JP;
Kazuto Matsuki, Tokyo, JP;
Souji Koikari, Kanagawa-ken, JP;
Shuichi Tamamushi, Kanagawa-ken, JP;
Kazuyuki Okuzono, Shizuoka-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern lithography system for lithographing a pattern with reference to a pattern data by deflecting an electron beam includes a controller, an extracting unit, a dividing unit, and an expansion unit. The controller analyzes the pattern data and determines stripes of the pattern to be successively lithographed. The extracting unit extracts parts of the pattern data corresponding to stripes of the pattern in response to commands from the controller and sends the data to the dividing unit. The dividing unit divides the part of the pattern data into a plurality of sub-patterns. The sub-patterns are sized smaller than a minimum deflection range of the electron beam. The expanding unit expands the sub-patterns in accordance with a command from the controller to produce stripe data for driving a lithographing unit to lithograph the stripe. Stripes may have at least one sub-pattern in common such that multiple lithography is performed.