Location History:
- Numazu, JP (1998 - 1999)
- Kanagawa-ken, JP (2001)
Company Filing History:
Years Active: 1998-2001
Title: The Innovative Mind of Souji Koikari: Pioneer in Electron Beam Technology
Introduction
Souji Koikari, a distinguished inventor based in Numazu, Japan, has made significant contributions to the field of electron beam lithography, holding a total of four patents. His latest inventions focus on enhancing the precision and efficiency of pattern lithography systems, showcasing his commitment to technological advancement and innovation.
Latest Patents
1. **Electron Beam Exposure Apparatus** - This innovative pattern lithography system utilizes an electron beam deflection mechanism to lithograph patterns with remarkable accuracy. The apparatus is equipped with a controller that analyzes pattern data, an extracting unit that pulls relevant data, a dividing unit that creates sub-patterns, and an expanding unit that prepares the stripe data for lithography. The design allows for multiple overlapping lithography operations, maximizing efficiency.
2. **Charged Particle Beam Exposure System** - Koikari's second significant invention addresses the challenge of maintaining accuracy during the patterning process. This system minimizes electron beam orbit shifts near the periphery of a substrate, enhancing the fidelity of the drawn patterns. Key components include a holder for the substrate, a beam source for the charged particles, and dual electrical conductive blocks controlled by separate DC power supplies, ensuring optimal performance of the patterning process.
Career Highlights
Souji Koikari has made his mark in the field through his tenure at Kabushiki Kaisha Toshiba. His work continues to push the boundaries of what is possible in electron beam technology, underscoring his role as an innovator in the industry. His dedication to research and development has earned him recognition and respect among his peers.
Collaborations
Throughout his career, Koikari has worked alongside talented individuals such as Kazuto Matsuki and Shuichi Tamamushi. Their collaborative efforts have likely contributed to the success of his projects and the advancement of their shared field.
Conclusion
Souji Koikari's innovative spirit and significant patent contributions reflect a deep understanding of electron beam technology and its applications. His work at Kabushiki Kaisha Toshiba and collaborations with co-inventors highlight a career dedicated to enhancing precision in lithography systems. As technology continues to evolve, Koikari's innovations will undoubtedly play a crucial role in shaping the future of electronics manufacturing.