The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2001

Filed:

Apr. 10, 2000
Applicant:
Inventors:

Yuji Kamikawa, Koshi-machi, JP;

Naoki Shindo, Kurume, JP;

Shigenori Kitahara, Chikugo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 1/300 ;
U.S. Cl.
CPC ...
B08B 1/300 ;
Abstract

A cleaning tank,stores a cleaning liquid to clean the surfaces of semiconductor wafers W immersed in the cleaning liquid. A cleaning liquid supply pipe,connects the cleaning tank,to a pure water supply source,. A chemical liquid container,stores a chemical liquid, and a chemical liquid supply pipe,connects the cleaning liquid supply pipe,to the chemical liquid container,via an infusion open/close switching valve,and a chemical liquid feed means is interposed in the chemical liquid supply pipe,. The chemical liquid feed means is a reciprocal pump, such as diaphragm pump,. Thus, a predetermined quantity of the chemical liquid can be infused into pure water or to a drying gas generator to ensure that the chemical liquid of a predetermined concentration be available for washing or drying treatment, regardless of fluctuations in flow amount or pressure of pure water or a drying gas carrier gas.


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