The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2001

Filed:

Mar. 30, 2000
Applicant:
Inventors:

Michihiko Yanagisawa, Ayase, JP;

Shinya Iida, Ayase, JP;

Yasuhiro Horiike, Houya, JP;

Assignee:

Speedfam Co., Ltd, Kanagawa-Pref., JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract

A corrosion-resistant system and method for a plasma etching apparatus are provided which are capable of reducing a corrosion or erosion phenomenon of a discharge tube, equipment and/or elements in a chamber of the plasma etching apparatus which is used for localized etching. A micro wave M is oscillated from a micro wave oscillator,toward a mixed gas of CF,and O,in a quartz discharge tube,to thereby produce plasma discharge. The micro wave oscillator,is controlled in an on-off manner by means of a pulse generator,, to thereby oscillate a pulsed micro wave M. As a result, it is possible to reduce the erosion of the quartz discharge tube,caused by an active species gas G generated by the plasma discharge. Preferably, a corrosion-resistant oil A is filled in the chamber,for preventing an X-Y drive mechanism,, etc., therein from being corroded or eroded by the active species gas G diffusing in the chamber


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