The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2001
Filed:
Jul. 09, 1999
Robin Cheung, Cupertino, CA (US);
Daniel A. Carl, Pleasanton, CA (US);
Yezdi Dordi, Palo Alto, CA (US);
Peter Hey, Sunnyvale, CA (US);
Ratson Morad, Palo Alto, CA (US);
Liang-Yuh Chen, Foster City, CA (US);
Paul F. Smith, San Jose, CA (US);
Ashok K. Sinha, Palo Alto, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention discloses a system that provides for electroless deposition performed in-situ with an electroplating process to minimize oxidation and other contaminants prior to the electroplating process. The system allows the substrate to be transferred from the electroless deposition process to the electroplating process with a protective coating to also minimize oxidation. The system generally includes a mainframe having a mainframe substrate transfer robot, a loading station disposed in connection with the mainframe, one or more processing facilities disposed in connection with the mainframe, an electroless supply fluidly connected to the one or more processing applicators and optionally includes a spin-rinse-dry (SRD) station, a rapid thermal anneal chamber and a system controller for controlling the deposition processes and the components of the electro-chemical deposition system.