The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2001

Filed:

Jun. 07, 2000
Applicant:
Inventors:

Masahito Tanabe, Ishikawa-ken, JP;

Kazumasa Wakiya, Kanagawa-ken, JP;

Masakazu Kobayashi, Kanagawa-ken, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 ;
U.S. Cl.
CPC ...
G03F 7/32 ;
Abstract

There is disclosed a photoresist stripping liquid composition of which the CIE 1976 L*a*b* color difference (&Dgr;E*,) specified in JIS (=Japanese Industrial Standard) Z 8730 is 30-180 (as referenced to pure water). The composition is excellent not only in stripping photoresist layers and the deposition (residue) that occurs after the etching or ashing step but also in protecting substrates from corrosion even if they have metallic, inorganic or like films formed on them. An improved method of stripping photoresists using the composition is also disclosed.


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Tanabe, Masahito. (2001). Photoresist stripping liquid composition and a method of stripping photoresists using the same (U.S. Patent No. 6218087). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6218087

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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