The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2001
Filed:
Jan. 27, 1999
Applicant:
Inventors:
Qinghuang Lin, Wappingers Falls, NY (US);
Timothy M. Hughes, Marlboro, NY (US);
George M. Jordhamo, Hopewell Junction, NY (US);
Ahmad D. Katnani, Poughkeepsie, NY (US);
Wayne M. Moreau, Wappingers Falls, NY (US);
Niranjan Patel, Fremont, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/725 ; G03F 7/004 ;
U.S. Cl.
CPC ...
G03C 1/725 ; G03F 7/004 ;
Abstract
A radiation sensitive resist composition exhibiting high resolution and enhanced etch resistance comprising a silicon containing polymeric additive, a non-silicon containing base polymer, a photoacid generator and a base is provided. A method of forming a patterned resist film is also provided. A resist film having an upper surface region enriched with silicon is also disclosed.