Wappingers Falls, NY, United States of America

George M Jordhamo


Average Co-Inventor Count = 2.5

ph-index = 5

Forward Citations = 218(Granted Patents)


Location History:

  • Wappingers Falls, NY (US) (1991 - 1996)
  • Hopewell Junction, NY (US) (2001 - 2002)

Company Filing History:


Years Active: 1991-2002

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):

Title: Innovator Spotlight: George M. Jordhamo

Introduction:

George M. Jordhamo, an accomplished inventor based in Wappingers Falls, NY, has made significant contributions to the field of chemical engineering and materials science. With a remarkable portfolio consisting of seven patents, his work primarily focuses on advancements in photoresist compositions utilized in integrated circuit manufacturing.

Latest Patents:

Among his latest innovations, Jordhamo pioneered two notable patents. The first is related to blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations. This invention encompasses a photoresist binder composition that combines a hydroxystyrene copolymer and a phenolic polymer, crucial for the formulation of high-performance lithographic resist compositions. The second patent addresses a resist composition process aimed at generating patterned resist layers on substrates. This radiation-sensitive resist composition is notable for its high resolution and enhanced etch resistance, incorporating a silicon-containing polymeric additive to improve performance.

Career Highlights:

Jordhamo's career is marked by his association with the International Business Machines Corporation (IBM), where he has contributed to cutting-edge research and development in materials for semiconductor applications. His innovative spirit and dedication to enhancing resist formulations have made a substantial impact on the industry.

Collaborations:

Working alongside talented coworkers, including George T. Galyon and Ahmad D. Katnani, Jordhamo has fostered collaboration that pushes the boundaries of technology and innovation. Their combined expertise plays a pivotal role in advancing the capabilities and applications of photoresist materials.

Conclusion:

George M. Jordhamo stands out as a significant figure in the field of invention, particularly within the semiconductor industry. His innovative patents and collaborations have not only enhanced the efficiency of integrated circuit manufacturing but also paved the way for future advancements in material science. With an impressive track record at IBM, Jordhamo continues to inspire future generations of inventors and researchers.

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