The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2001
Filed:
Feb. 18, 1999
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A method for forming an image array optoelectronic microelectronic fabrication, and the image array optoelectronic microelectronic fabrication formed employing the method. There is first provided a substrate having a photoactive region formed therein. There is then formed over the substrate a patterned microlens layer which functions to focus electromagnetic radiation with respect to the photoactive region of the substrate. The patterned microlens layer is formed of a first material having a first index of refraction. Finally, there is then formed conformally upon the patterned microlens layer an encapsulant layer, where the encapsulant layer is formed of a second material having a second index of refraction no greater than, and preferably less than, the first index of refraction of the first material. The method of the present invention contemplates an image array optoelectronic microelectronic fabrication formed employing the method of the present invention. The method is particularly useful for forming image array optoelectronic microelectronic fabrications with enhanced optical stability.