The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2000
Filed:
Sep. 30, 1997
Stanislaw Kopacz, Phoenix, AZ (US);
Douglas Arthur Webb, Phoenix, AZ (US);
Gerrit Jan Leusink, Tempe, AZ (US);
Rene Emile LeBlanc, East Haven, CT (US);
Michael S Ameen, Phoenix, AZ (US);
Joseph Todd Hillman, Scottsdale, AZ (US);
Robert F Foster, Mesa, AZ (US);
Robert Clark Rowan, Jr, Phoenix, AZ (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method and apparatus for depositing a film by chemical vapor deposition comprises a showerhead for dispersing reactant gases into the processing space wherein the showerhead has a first space therein operable for receiving and dispersing the first reacting gas, and has a second space therein, generally isolated from the first space, and operable for receiving and dispersing the second reactant gas separate from the first gas dispersion for maintaining segregation of reactant gases and generally preventing premature mixture of the gases prior to their introduction into the processing space to prevent premature deposition in the system.