The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2000

Filed:

Jul. 23, 1999
Applicant:
Inventors:

Fu-Chang Hsu, Saratoga, CA (US);

Hsing-Ya Tsao, Santa Clara, CA (US);

Peter W Lee, Saratoga, CA (US);

Vei-Han Chan, San Jose., CA (US);

Hung-Sheng Chen, San Jose., CA (US);

Assignee:

Aplus Flash Technology, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11C / ;
U.S. Cl.
CPC ...
36518529 ; 36518533 ; 365226 ; 365227 ; 365218 ;
Abstract

In the present invention a flash memory configuration is disclosed that eliminates the need for one of two pump circuits that are commonly required to support an erase function of memory cells on a flash memory chip. The flash memory cells are placed into a triple well structure with a P-well contained within a deep N-well that resides on a P-substrate. The bias voltages for erase of the flash memory cells are chosen so as to require only one voltage pump circuit to be included in the flash memory chip. The chip bias, V.sub.DD, is used for the source of the memory cells and a negative gate voltage is raised in magnitude to maintain the efficiency of the erase operation. The P-well is biased with a negative voltage that is sufficient to prevent the high negative voltage connected to the gate from causing breakdown in word line decoder circuits. The deep N-well and the P-substrate are biased such as to back bias the P/N junctions between the triple well structure.


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