The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2000

Filed:

Oct. 20, 1999
Applicant:
Inventors:

Jian-Hsing Lee, Hsin-Chu, TW;

Kuo-Reay Peng, Faung-Shan, TW;

Shui-Hung Chen, Hsin-Chu, TW;

Jiaw-Ren Shih, Hsin-Chu, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C / ;
U.S. Cl.
CPC ...
36518529 ; 36518519 ; 36518526 ; 36518527 ;
Abstract

A method to channel erase data from a flash EEPROM while electrical charges trapped in the tunneling oxide of a flash EEPROM are eliminated to maintain proper separation of the programmed threshold voltage and the erased threshold voltage after extended programming and erasing cycles. The method to channel erase a flash EEPROM cell begins by removing the charge from the floating gate of the flash EEPROM cell. The channel erasing consists of applying a relatively large clipped sinusoidal negative voltage pulse to the control gate of said EEPROM cell and concurrently applying a moderately large positive voltage pulse to a first diffusion region. At the same time a ground reference potential is applied to the semiconductor substrate, while the drain, the source and a second diffusion well are allowed to float.


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