The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2000
Filed:
Mar. 27, 1998
Applicant:
Inventors:
David B James, Newark, DE (US);
William D Budinger, Wilmington, DE (US);
John V Roberts, Newark, DE (US);
Michael R Oliver, Tigard, OR (US);
Nina G Chechik, Hockessin, DE (US);
Richard M Levering, Jr, Hockessin, DE (US);
Assignee:
Rodel Holdings, Inc., Newark, DE (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451 72 ; 51298 ; 51307 ; 451527 ; 451550 ;
Abstract
A chemical-mechanical polishing system which is particularly well suited for use in the manufacture of semiconductor devices or the like. The invention is directed to a self-dressing, polishing pad comprising a high modulus phase and a low modulus phase. The multi-phase polishing pads are very efficient and effective in providing high performance polishing along an entire polishing surface interface.