The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2000
Filed:
Jun. 29, 1999
Applicant:
Inventors:
David L Rath, Stormville, NY (US);
Rangarajan Jagannathan, South Burlington, VT (US);
Kenneth J McCullough, Fishkill, NY (US);
Harald F Okorn-Schmidt, Putnam Valley, NY (US);
Karen P Madden, Poughquag, NY (US);
Keith R Pope, Danbury, CT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
252 792 ; 252 794 ; 252 793 ; 438745 ; 438756 ; 438757 ;
Abstract
Silicon nitride is etched employing a composition containing a fluoride containing compound, certain organic solvents, and water.
Rath, David. (2000). Etching of silicon nitride (U.S. Patent No. 6066267). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6066267
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile