The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2000
Filed:
Jan. 27, 1998
James J Bucchignano, Yorktown, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Ahmad D Katnani, Poughkeepsie, NY (US);
Kim Y Lee, Fremont, CA (US);
Wayne M Moreau, Wappinger, NY (US);
Karen E Petrillo, Mahopac, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems of the present invention containing the new protecting group have improved shelf-life and vacuum stability as compared to the prior art resists. Thus, the resists of the present invention are highly useful in e-beam lithographic applications.