The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 1999

Filed:

Dec. 31, 1997
Applicant:
Inventors:

Lawrence D Wong, Beaverton, OR (US);

Indrajit Banerjee, San Jose, CA (US);

Steven Towie, Menlo Park, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438783 ; 148D / ; 438623 ; 438624 ;
Abstract

The present invention is a liner and/or barrier layer that will encapsulate the low k materials and act as a diffusion barrier between the low k material and the surrounding metal layers. As the temperatures of the processing sequence increase the liner and/or barrier layer will decrease the diffusion of fluorine from the low k material into the surrounding metal layers. Thus, the present invention will reduce potential corrosion problems of the metal layers.


Find Patent Forward Citations

Wong, Lawrence. (1999). Unique .alpha.-c:n:h/.alpha.-c:n.sub.x film liner/barrier to prevent (U.S. Patent No. 5946601). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5946601

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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