The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 1999
Filed:
Jul. 22, 1997
Applicant:
Inventors:
Kazuyuki Nitta, Ebina, JP;
Kazufumi Sato, Sagamihara, JP;
Akiyoshi Yamazaki, Yokohama, JP;
Yoshika Sakai, Atsugi, JP;
Toshimasa Nakayama, Chigasaki, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430170 ; 4302701 ; 430905 ; 430920 ;
Abstract
Proposed is a positive-working chemical-sensitization photoresist composition having advantages in respect of high resolution of patterning, high photosensitivity and orthogonal cross sectional profile of the patterned resist layer as well as in respect of little dependency of the performance on the nature of the substrate surface. The composition comprises:
Quick Actions:
Nitta, Kazuyuki. (1999). Chemical-sensitization positive-working photoresist composition (U.S. Patent No. 5945248). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5945248
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile