The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1999
Filed:
Dec. 09, 1997
Applicant:
Inventors:
Mitsuru Sato, Hillsboro, OR (US);
Kiyoshi Ishikawa, Kanagawa-Ken, JP;
Yoshiki Sugeta, Yokohama, JP;
Hiroyuki Yamazaki, Kanagawa-Ken, JP;
Toshikazu Tachikawa, Yokohama, JP;
Hiroshi Komano, Kanagawa-Ken, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
4302701 ; 430919 ; 430921 ;
Abstract
Proposed is a novel negative-working chemical-sensitization photoresist composition used in the photolithographic patterning work for the manufacture of semiconductor devices and the like and capable of giving a patterned resist layer with high sensitivity and pattern resolution as well as excellent heat resistance and excellently orthogonal cross sectional profile of the patterned resist layer. The composition comprises, as a uniform solution: