The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 1999
Filed:
Feb. 11, 1997
Jeffrey C Hedrick, Park Ridge, NJ (US);
Konstantinos Papathomas, Endicott, NY (US);
Stephen L Tisdale, Hopewell Junction, NY (US);
Alfred Viehbeck, Fishkill, NY (US);
Jeffrey D Gelorme, Plainville, CT (US);
Voya Rista Markovich, Endwell, NY (US);
Thomas H Lewis, Apalachin, NY (US);
Stephen Joseph Fuerniss, Endicott, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed is an admixture which is curable to form a crack resistant, photosensitive polycyanurate resist. Also disclosed is a structure for its use and process of making. The resist can be tailored to be either positively or negatively sensitive to actinic radiation. Because of its improved thermal and mechanical properties, the cured resist is suitable for use at high temperature, such as in electronic packaging applications.