The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1999
Filed:
May. 09, 1996
David Mark Dobuzinsky, Hopewell Junction, NY (US);
Stephen Gerard Fugardi, New Milford, CT (US);
Erwin Hammerl, Stormville, NY (US);
Herbert Lei Ho, New Windsor, NY (US);
Samuel C Ramac, Wappinger Falls, NY (US);
Alvin Wayne Strong, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Siemens Aktiengesellschaft, , DE;
Abstract
According to the preferred embodiment of the present invention, an improved resistor and method of fabrication is provided. The method for fabricating a resistive element into an integrated circuit semiconductor device comprises the steps of: depositing a dielectric film, such as silicon nitride; depositing a titanium film upon the dielectric film; and annealing the titanium and dielectric films. This causes titanium to be diffused into the dielectric film. This creates a resistive element having a relatively high resistivity. The preferred embodiment method has the advantage of being easily integrated into conventional integrated circuit fabrication techniques.