The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1999
Filed:
Oct. 16, 1996
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method of forming high contrast alignment marks on an integrated circuit wafer for patterning a layer of highly reflective electrode metal is described. A method of patterning a layer of highly reflective metal on an integrated circuit wafer using high contrast alignment marks is also described. Due to a difference in height of alignment marks and contact metal surrounding the alignment marks the alignment marks are transferred to the contour of the highly reflective electrode metal. A non reflective layer of bottom anti-reflection coating material is then used to provide high contrast at the location where the edges of the alignment marks are transferred to the highly reflective electrode metal.