The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 1998
Filed:
Feb. 28, 1997
Kei Hattori, Yokohama, JP;
Akira Kobayashi, Nagoya, JP;
Mikio Nonaka, Sagamihara, JP;
Makoto Muto, Ayase, JP;
Masaru Kasai, Zama, JP;
Toshiyasu Onoda, Edogawa-Ku, JP;
Tomoaki Yoshimori, Zama, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Shibaura Engineering Works Co., Ltd., Tokyo-To, JP;
Abstract
A metal film etching method etches selectively a metal film formed on a layer insulating film provided with viaholes so as to cover the surface of the layer insulating film and fill up the viaholes so that the metal film excluding portions there of filling up the viaholes are removed completely without forming a pit in the portions of the metal film filling up the viaholes. The metal film etching method uses a mixed reactive gas of a gas containing fluorine atoms, a gas containing chlorine atoms and oxygen gas.