The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 1998

Filed:

Sep. 03, 1997
Applicant:
Inventors:

Masayuki Imai, Kofu, JP;

Masaaki Amemiya, Shikishima-cho, JP;

Kazuhide Hasebe, Shirane-machi, JP;

Norihito Kaneko, Nirasaki, JP;

Assignee:

Tokyo Electron, Ltd., Tokyo-to, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356381 ; 25055927 ;
Abstract

A sample is placed on a sample receiving stage for receiving the sample. The sample is transferred one at a time to a measuring table, and a thickness of a thin film formed on a surface of the sample is measured by irradiating the surface of the sample with a measuring light beam. A covering structure is disposed between the sample receiving stage and the measuring table to define a sample transfer space and a measuring space in which the measuring table is disposed. A high-purity purging gas containing only a very small amount of contaminants is supplied through purging gas supply devices into the transfer space and the measuring space covered with the covering structure.


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