The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 1998

Filed:

Nov. 07, 1996
Applicant:
Inventors:

Yoshio Morishige, Saitama, JP;

Hisato Nakamura, Saitama, JP;

Tetsuya Watanabe, Saitama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
356237 ; 25055945 ;
Abstract

An extraneous substance inspection apparatus for a patterned wafer, according to the present invention, comprises an optical sensor having a plurality of detecting portions arranged to receive the scattering light corresponding to pixels and produce the detection signal corresponding to the respective pixels, a delay circuit responsive to the detection signal from the optical sensor for delaying the detection signal by a predetermined time and a judging circuit for judging an absence or presence of contaminant by comparing an output of the delay circuit with the detection signal from said optical sensor, wherein the wafer is inclined by a predetermined angle with respect to a direction parallel to the arranging direction of the detecting portions of the optical sensor and the predetermined time corresponds to a difference in scan time between a position of one pixel and substantially the same position as that of the one pixel in one chip of another pixel in another chip adjacent to that chip, the another pixel being determined corresponding to the predetermined angle in the X-Y scanning.


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