The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 1997
Filed:
Sep. 13, 1995
Mitsuo Tabata, Yokohama, JP;
Toru Tojo, Kanagawa-ken, JP;
Kiminobu Akeno, Yokohama, JP;
Toshiyuki Watanabe, Yokohama, JP;
Tomohide Watanabe, Yokohama, JP;
Eiji Yamanaka, Yokohama, JP;
Chikara Itoh, Matsudo, JP;
Makoto Taya, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Kabushiki Kaisha Topcon, Tokyo, JP;
Abstract
The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.