The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 1995
Filed:
Dec. 01, 1994
Applicant:
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05B / ;
U.S. Cl.
CPC ...
118300 ; 118 52 ; 118 64 ; 118 66 ; 118319 ; 118320 ; 118324 ; 118326 ; 118708 ; 118725 ; 118730 ;
Abstract
An apparatus for applying spin-on-glass material to a wafer under controlled humidity conditions is described, The apparatus comprises a treatment chamber. Within the treatment chamber are a spin-on-glass coater spin table, a plurality of hotplates connected to one another and from the coater spin table by a moving belt, and wafer handlers to transfer wafers onto the coater spin table and onto the moving belt. A dehumidifier is disposed on top of the treatment chamber and a humidity control unit is disposed on top of the dehumidifier through which air is drawn and whereby relative humidity within the treatment chamber can be controlled.