The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 1991
Filed:
Feb. 28, 1990
Katsuya Okumura, Yokohama, JP;
Takahiko Moriya, Yokohama, JP;
Shinji Miyazaki, Yokohama, JP;
Yoshio Kumagai, Kofu, JP;
Susumu Tanaka, Hachioji, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Tokyo Electron Sagami Limited, Kanagawa, JP;
Abstract
A film forming method comprises the steps of placing a plurality of objects to be processed and supplying an etching gas in a reaction container, removing a natural oxidization originated film on an object to be processed placed in the reaction container under a heating condition by plasma etching, exhausting the etching gas after stopping supply of the etching gas so as to stop making of the plasma, and supplying a film forming gas in the reaction container without rendering the reaction container open to air so as to form a film on the objects.