The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 1988
Filed:
Aug. 31, 1987
Paul Esrig, Saratoga, CA (US);
Eliezer Rosengaus, Palo Alto, CA (US);
Ezra Van Gelder, Belmont, CA (US);
KLA Instruments Corporation, Santa Clara, CA (US);
Abstract
An optical emission microscopy system with a macro optic system having a high numerical aperture for obtaining global views of an integrated circuit Device Under Test (DUT). The DUT is subjected to illumination and stimulation conditions, and images are obtained to form a 'global difference' image in which defects, wherever located in the chip, can be discerned by the system operator. The operator can select apparent 'defect bright spots' to be further inspected, and zoom in with the higher magnification micro optics system to repeat the image formation steps. 'Difference images' are processed to further eliminate noise spots using an improved two-stage filtering operation. The system may be operated under manual or automatic control, and may be interfaced to various data input, storage, and output devices as desired.