The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 1988
Filed:
Jul. 29, 1987
Applicant:
Inventors:
Mitsuaki Minato, Kanagawa, JP;
Isamu Hijikata, Kanagawa, JP;
Akira Uehara, Kanagawa, JP;
Muneo Nakayama, Tokyo, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; B29C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156345 ; 156643 ; 156656 ; 1566591 ; 156668 ; 156626 ; 427 431 ; 427 541 ; 430313 ; 430330 ;
Abstract
An equipment (100; 200) for thermal stabilization process of photoresist pattern on semiconductor wafer comprises an ultraviolet lamp (20) by which a photoresist pattern formed on a semiconductor wafer (W) put in a process chamber (S) under vacuum pressure is irradiated with ultraviolet rays of a predetermined strength, and a heater (10) for heating the wafer to a predetermined temperature.