The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 1981

Filed:

Jun. 26, 1980
Applicant:
Inventors:

Keizo Suzuki, Kokubunji, JP;

Sadayuki Okudaira, Kokubunji, JP;

Shigeru Nishimatsu, Kokubunji, JP;

Ichiro Kanomata, Fuchu, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; H01L / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156345 ; 156643 ; 156646 ; 156657 ; 2041 / ; 204298 ; 250531 ;
Abstract

A dry etching apparatus using microwaves according to the present invention is equipped with means for impressing such an AC voltage upon a sample as has a frequency ranging from 100 KHx to 10 MHx. Consequently, the sample has its surface prevented from being charged up no matter which it might be made of an insulator or might have its surface covered with an insulator. As a result, the etching rate can be maintained at a high level even for such sample.


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