The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 1981
Filed:
Sep. 12, 1978
Georges Constant, Ramonville Saint Agne, FR;
Raymond Haran, Grenade, FR;
Albert Lebugle, Toulouse, FR;
Aref Zaouk, Toulouse, FR;
Roland Morancho, Toulouse, FR;
Philippe Pouvreau, Maillezais, FR;
Agence Nationale de Valorisation de la Recherche (ANVAR), Neuilly sur Seine, FR;
Abstract
A process for depositing a layer of a semiconductor composition comprising elements M(III) and M'(V) selected from group III and group V elements, respectively onto a substrate. The process comprises: contacting the substrate with a coordination compound in the gaseous phase, the compound having the formula: ##STR1## wherein M(III) and M'(V) are bonded to one another by a donor/acceptor bond and wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 are chemical radicals other than hydrogen with at least one of the radicals R.sub.1, R.sub.2, and R.sub.3 being an electron donor serving to stabilize the donor/acceptor bond between elements M(III) and M'(V). The process further comprises decomposing the coordination compound so as to break the chemical bonds between the radicals and the elements M(III) and M'(V) without breaking the donor/acceptor bond, so as to cause the semi-conductor composition to deposit onto the substrate. Substrates having a semi-conductor layer comprising elements selected from groups III and V deposited by the process of the invention are also disclosed.