Multi-fin fin-type field effect transistor with fine-tuned effective channel width

Abstract

Disclosed are a structure including a fin-type field effect transistor (FINFET) and a method. The FINFET includes first and second fins. An isolation structure is adjacent the outer sidewall of the first fin at a channel region and, optionally, fills a groove in the outer sidewall so the fin width is reduced. A gate is adjacent the inner sidewall of the first fin at the channel region and extends over the first fin to the isolation structure. The gate is further adjacent an inner sidewall and top of the second fin at a channel region. In some embodiments, a second isolation structure is adjacent an outer sidewall of the second fin at the channel region and, optionally, fills a groove in the outer sidewall so the fin width is reduced. In this case, the gate extends over the second fin to the second isolation structure.