The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2026

Filed:

Jun. 01, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Yen-Hao Liu, Hsinchu City, TW;

Shao-Hua Wang, Taoyuan City, TW;

Zheng-Hao Zhang, Hsinchu City, TW;

Fan-Chi Lin, Hsinchu, TW;

Chueh-Chi Kuo, Kaohsiung City, TW;

Li-Jui Chen, Hsinchu City, TW;

Heng-Hsin Liu, New Taipei City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70591 (2013.01); G03F 7/70741 (2013.01); G03F 7/7085 (2013.01); G03F 7/70983 (2013.01);
Abstract

A method includes transferring an inner pod of a carrier out from an outer pod of the carrier into a lithography exposure apparatus, the inner pod containing a reticle including a reflective multilayer and a pellicle underlying the reflective multilayer; detecting a condition of the pellicle using a metrology device positioned on a base plate of the inner pod during transferring the inner pod in the lithography exposure apparatus; determining whether the condition of the pellicle is acceptable; issuing a warning when the condition of the pellicle is not acceptable.


Find Patent Forward Citations

Quick Actions:

Liu, Yen-Hao. (2026). Detection method of euv pellicle status (U.S. Patent No. 12791949). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12791949

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