The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2026
Filed:
Dec. 01, 2020
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Takayuki Fujiwara, Joetsu, JP;
Kenichi Oikawa, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Masahiro Fukushima, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); C07C 69/76 (2006.01); C07C 381/12 (2006.01); G03F 7/004 (2006.01); G03F 7/028 (2006.01); G03F 7/038 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
C07C 381/12 (2013.01); C07C 69/76 (2013.01); G03F 7/0045 (2013.01); G03F 7/028 (2013.01); G03F 7/0382 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01);
Abstract
The onium salt having formula (1) serves as an acid diffusion inhibitor. The chemically amplified resist composition includes the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.
Quick Actions:
Fujiwara, Takayuki. (2026). Onium salt compound, chemically amplified resist composition and patterning process (U.S. Patent No. 12790293). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12790293
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile